The process starts with a laser beam or electron beam writing a pattern on fused silica or silicon.
dished shape supports and relieves the electronics, which correct the electron beam spot and thus allows optimum definition at the edge.
An image is created on the CRT surface by varying the electron beam intensity for each pixel.
Chen's method describes how to make a " master " or mold of a chip, using electron beam lithography.
Structures are fabricated by making use of our new nanofabrication facility based around focused ion-beam and electron-beam lithography.